Person

Dipl.-Min.

Birgit Hadam

Lehrstuhl für Halbleitertechnik und Institut für Halbleitertechnik

Address

Building: Walter-Schottky-Haus

Room: 24C208

Sommerfeldstraße 18

52074 Aachen

Contact

workPhone
Phone: +49 241 80 27905
Fax: +49 241 80 22246
 

Publications

Source Author(s)
[Contribution to a conference proceedings]
Fabrication of monolithic bidirectional switch (MBS) devices with MOS-controlled emitter structures
In: IEEE International Symposium on Power Semiconductor Devices and ICs, 2006 : [ISPSD '06] ; 04 - 08 June 2006, [Naples, Italy], 2006
[DOI: 10.1109/ISPSD.2006.1666101]
Baus, M.
Szafranek, Bartholomäus Nikolaus
Chmielus, St.
Lemme, Max C.
Hadam, Birgit
Spangenberg, Bernd
Sittig, R.
Kurz, Heinrich
[Contribution to a conference proceedings, Journal Article]
High-density silicon nanowire growth from self-assembled Au nanoparticles
In: Microelectronic engineering, 83 (4/9), 1530-1533, 2006
[DOI: 10.1016/j.mee.2006.01.145]
Albuschies, J.
Baus, M.
Winkler, O.
Hadam, Birgit
Spangenberg, Bernd
Kurz, Heinrich
[Contribution to a conference proceedings, Journal Article]
Reproducibility and homogeneity in step and repeat UV-nanoimprint lithography
In: Microelectronic engineering, 73/74.2004, 152-156, 2004
[DOI: 10.1016/j.mee.2004.02.032]
Otto, M.
Bender, M.
Richter, Frank
Hadam, Birgit
Kliem, T.
Jede, R.
Spangenberg, Bernd
Kurz, Heinrich
[Journal Article]
Fabrication of wire-MOSFETs on silicon-on-insulator substrate
In: Microelectronic engineering, 61/62, 613-618, 2002
[DOI: 10.1016/S0167-9317(02)00465-3]
Heuser, M.
Baus, M.
Hadam, B.
Winkler, O.
Spangenberg, B.
Granzner, R.
Lemme, M.
Kurz, Heinrich
[Journal Article]
Concept of floating-dot memory transistors on silicon-on-insulator substrate
In: Microelectronic engineering, 61/62, 497-503, 2002
[DOI: 10.1016/S0167-9317(02)00463-X]
Winkler, O.
Merget, F.
Heuser, M.
Hadam, B.
Baus, M.
Spangenberg, B.
Kurz, Heinrich
[Journal Article]
Multiple imprinting in UV-based nanoimprint lithography: related material issues
In: Microelectronic engineering, 61/62, 407-413, 2002
[DOI: 10.1016/S0167-9317(02)00470-7]
Bender, M.
Otto, M.
Hadam, B.
Spangenberg, B.
Kurz, Heinrich
[Journal Article]
Characterization and application of a UV-based imprint technique
In: Microelectronic engineering, 57/58, 361-366, 2001
[DOI: 10.1016/S0167-9317(01)00536-6]
Otto, M.
Bender, M.
Hadam, Birgit
Spangenberg, Bernd
Kurz, Heinrich
[Journal Article]
Fabrication of nanostructures using a UV-based imprint technique
In: Microelectronic engineering, 53 (1/4), 233-236, 2000
[DOI: 10.1016/S0167-9317(00)00304-X]
Bender, M.
Otto, M.
Hadam, B.
Vratzov, B.
Spangenberg, B.
Kurz, Heinrich
[Journal Article]
Coulomb blockade effects in a highly doped silicon quantum wire fabricated on novel molecular beam epitaxy grown material
In: Japanese journal of applied physics : JJAP / Part 1, Regular papers, brief communications & review papers, 38 (1B), 465-468, 1999
[DOI: 10.1143/JJAP.38.465]
Köster, Thomas
Goldschmidtböing, Frank
Hadam, Birgit
Stein, Josef
Altmeyer, Stefan
Spangenberg, Bernd
Kurz, Heinrich
Neumann, R.
Brunner, K.
Abstreiter, Gerhard
[Journal Article]
Direct patterning of single electron tunneling transistors by high resolution electron beam lithography on highly doped molecular beam epitaxy grown silicon films
In: Journal of vacuum science & technology : JVST / B, 16 (6), 3804-3807, 1998
[DOI: 10.1116/1.590412]
Köster, T.
Goldschmidtboeing, F.
Hadam, B.
Stein, J.
Altmeyer, Stefan
Spangenberg, Bernd
Kurz, Heinrich
Neumann, R.
Brunner, K.
Abstreiter, Gerhard
[Journal Article]
MOS-compatible fabrication and characterization of tunnel junctions in BESOI-material
In: Microelectronic engineering, 42, 531-534, 1998
Köster, Thomas
Hadam, B.
Goldschmidtböing, Frank
Hofmann, K.
Gondermann, J.
Stein, J.
Hu, S.
Altmeyer, Stefan
Spangenberg, Bernd
Kurz, Heinrich
[Journal Article]
New concept for ultra small N-MOSFET's
In: Microelectronic engineering, 35 (1/4), 305-308, 1997
[DOI: 10.1016/S0167-9317(96)00134-7]
Gondermann, J.
Schiepanski, J.
Hadam, B.
Köster, T.
Röwer, T.
Stein, J.
Spangenberg, Bernd
Roskos, H.
Kurz, Heinrich
[Journal Article]
Fabrication and characterisation of SiGe based in-plane-gate transistors
In: Microelectronic engineering, 35 (1/4), 301-304, 1997
[DOI: 10.1016/S0167-9317(96)00132-3]
Köster, T.
Stein, J.
Hadam, B.
Gondermann, J.
Spangenberg, B.
Roskos, H. G.
Kurz, Heinrich
Holzmann, M.
Riedinger, M.
Abstreiter, Gerhard
[Journal Article]
Metal-oxide-semiconductor-compatible silicon based single electron transistors using bondede and etched back silicon on insular material
In: Journal of vacuum science & technology : JVST / B, 15 (6), 2836-2839, 1997
[DOI: 10.1116/1.589739]
Köster, T.
Hadam, B.
Hofmann, K.
Gondermann, J.
Stein, J.
Hu, S.
Altmeyer, Stefan
Spangenberg, Bernd
Kurz, Heinrich
[Journal Article]
A triangle-shaped nanoscale metal-oxide-semiconductor device
In: Journal of vacuum science & technology : JVST / B, 14 (6), 4042-4045, 1996
[DOI: 10.1116/1.588640]
Gondermann, J.
Rower, T.
Hadam, B.
Koster, T.
Stein, J.
Spangenberg, Bernd
Roskos, H.
Kurz, Heinrich
[Journal Article]
Optical properties of reactive-ion-etched Si/Si1-xGex heterostructures
In: Journal of vacuum science & technology : JVST / B, 14 (2), 698-706, 1996
[DOI: 10.1116/1.589159]
Köster, T.
Gondermann, J.
Hadam, B.
Spangenberg, Bernd
Schütze, M.
Roskos, H. G.
Kurz, Heinrich
Brunner, J.
Abstreiter, Gerhard
[Contribution to a conference proceedings, Journal Article]
Electron beam lithography and ion implantation techniques for fabrication of high-T-c Josephson junctions
In: Microelectronic engineering, 30 (1/4), 407-410, 1996
[DOI: 10.1016/0167-9317(95)00274-X]
Barth, R.
Hamidi, A. H.
Hadam, Birgit
Hollkott, J.
Dunkmann, Dieter
Auge, J.
Kurz, Heinrich
[Contribution to a conference proceedings, Journal Article]
Investigation of Si/SiGe heterostructures patterned by reactive ion etching
In: Microelectronic engineering, 30 (1/4), 341-344, 1996
[DOI: 10.1016/0167-9317(95)00259-6]
Köster, T.
Hadam, B.
Gondermann, J.
Spangenberg, B.
Roskos, H. G.
Kurz, Heinrich
Brunner, J.
Abstreiter, Gerhard
[Journal Article]
Fabrication and characterization of locally grown sige wires and dots
In: Materials science and technology : MST, 11 (4), 407-409, 1995
Gondermann, J.
Spangenberg, B.
Koster, T.
Hadam, B.
Roskos, H. G.
Kurz, Heinrich
Brunner, J.
Schnittenhelm, P.
Abstreiter, Gerhard
Gossner, H.
Eisele, I.
[Journal Article]
Local epitaxy of Si/SiGe wires and dots
In: Journal of crystal growth, 157 (1/4), 270-275, 1995
[DOI: 10.1016/0022-0248(95)00325-8]
Brunner, J.
Jung, W.
Schittenhelm, P.
Gail, M.
Abstreiter, Gerhard
Gondermann, J.
Hadam, B.
Köster, T.
Spangenberg, Bernd
Roskos, H. G.
Kurz, Heinrich
Gossner, H.
Eisele, I.
[Journal Article]
Sige wires and dots grown by local epitaxy
In: Journal of crystal growth, 150 (1/4), 1060-1064, 1995
[DOI: 10.1016/0022-0248(95)80101-H]
Brunner, J.
Schnittenhelm, P.
Gondermann, J.
Spangenberg, B.
Hadam, B.
Köster, T.
Rorskos, H. G.
Kurz, Heinrich
Gossner, H.
Eisele, I.
Abstreiter, Gerhard
[Contribution to a conference proceedings, Journal Article]
Fabrication and characterization of si/sige nanometer structures
In: Microelectronic engineering, 27 (1/4), 83-86, 1995
[DOI: 10.1016/0167-9317(94)00061-X]
Gondermann, J.
Spangenberg, Bernd
Köster, T.
Hadam, B.
Roskos, H. G.
Kurz, Heinrich
Brunner, J.
Schittenhelm, P.
Abstreiter, Gerhard
Grossner, H.
Eisele, I.